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Plasma Emission Monitoring (PEM)

Brand: Denton Vacuum | Category: Nanotechnology

Plasma Emission Monitoring (PEM). Manufacturer photograph illustrating plasma emission monitoring during processing.
Manufacturer photograph illustrating plasma emission monitoring during processing.

A closed loop control system for transition mode, high rate reactive sputtering of metal oxides and nitrides. It reads a plasma emission line in real time and adjusts the reactive gas setpoint to hold intensity constant, which avoids target poisoning and keeps deposition rates near metal mode.

Technical Specifications

ParameterValue
Controlclosed loop feedback on a monitored plasma emission line
Functionautomatically adjusts reactive gas setpoint to maintain constant intensity
SpecificationEnables near-metal mode deposition rates for insulating films
Applicationshigh rate optical film deposition, process quality control, metallurgical research

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Contact Vvon Technologies Limited about Denton Vacuum equipment requirements in Bangladesh.

Phone: +8801805987890 | Email: info@vvon.com.bd

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