ASx Series Photomask Processing Platform
Brand: SUSS MicroTec | Category: Nanotechnology
An automated photomask processing platform that carries out advanced bake, resist strip, clean and develop steps in one system. A 25 zone hotplate holds the bake temperature closely, which is what sets critical dimension uniformity on advanced masks.
Technical Specifications
| Parameter | Value |
|---|---|
| Process range | bake, resist strip, clean and develop on 250 nm to 65 nm wafers |
| Hotplate | 25 zones |
| Bake control | automated tuning across 90 °C to 130 °C |
| Footprint | 1200 x 1200 mm |
| Specification | Qualified for masks exposed at 248 nm and 193 nm |
| Specification | Advanced bake qualified down to 14 nm node and beyond |
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Contact Vvon Technologies Limited about SUSS MicroTec equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
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