MaskTrack Pro Series Photomask Cleaning Platform
Brand: SUSS MicroTec | Category: Nanotechnology
A photomask cleaning and processing platform built for extreme ultraviolet lithography, 193i immersion work at 1x nm half-pitch and nanoimprint masks. The modular frame can be clustered with third party tools so storage, handling and processing stay in one controlled environment.
Technical Specifications
| Parameter | Value |
|---|---|
| Processes | 193i 1x nm half-pitch double patterning, EUV lithography and nanoimprint masks |
| Architecture | modular and extendable for clustering with third party products |
| Cleaning | dual megasonic, high-pressure Fulljet, brush, in-situ SC1/SPM and UV dry cleaning |
| Developing | A+ nozzle dispense with ASONIC megasonic technology |
| Environment | DIN EN ISO 14644 Class 2 |
| Compliance | SEMI S2, S8 and S13, CE marked, SECS/GEM 200/300 mm interface |
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Contact Vvon Technologies Limited about SUSS MicroTec equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
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