Brand: Durham Magneto Optics | Category: Nanotechnology

A desktop direct write lithography machine with two software selectable resolutions, so critical and non-critical areas of a pattern can be exposed in one run. It adds an optical surface profiler and automatic wafer inspection to the Baby platform.
| Parameter | Value |
|---|---|
| Maximum writing area | 149 mm x 149 mm |
| Minimum feature sizes | 1 um and 5 um across the full writing area |
| Writing speed | up to 50 mm2 per minute at 1 um and 180 mm2 per minute at 5 um |
| Alignment accuracy | plus or minus 1 um, 3 sigma |
| Specification | 60 nm minimum addressable grid, 15 nm sample stage resolution |
| Specification | Built-in optical surface profiler with 200 nm thickness resolution |
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Contact Vvon Technologies Limited about Durham Magneto Optics equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
A desktop direct write lithography machine offering three software selectable resolutions down to 0.6 um. It is used for microelectronics, spintronics, MEMS, sensors and microfluidics work where sub-micron critical features sit alongside coarse structures.
An entry level desktop direct write optical lithography machine. It exposes photoresist patterns straight from a design file without a mask, and is aimed at university and industrial research groups working on microelectronics, MEMS and microfluidics.
The top model in the MicroWriter ML3 family, supplied on a passive vibration isolation optical table. It writes over a 195 mm square area at four selectable resolutions and includes a virtual mask aligner mode and multiple wafer handling for overnight runs.