Brand: Moorfield Nanotechnology | Category: Nanotechnology

A compact benchtop RF and DC magnetron sputtering system for research laboratories and cleanrooms. It deposits metals, oxides, nitrides and multilayers on substrates up to 4 inches, with reactive and co-deposition options.
| Parameter | Value |
|---|---|
| Base pressure | 5x10-7 mbar |
| Sputter sources | up to 3 x 2 inch water cooled magnetrons |
| Maximum substrate size | 4 inch (100 mm) |
| Process gas inlets | up to 3 MFC controlled gases |
| Specification | Substrate heating up to 500 deg C optional, up to 600 deg C with 4-bulb configuration |
| Footprint | 800 x 500 x 550 mm |
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Contact Vvon Technologies Limited about Moorfield Nanotechnology equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
A wide area version of the benchtop nanoPVD sputtering platform for larger research substrates. It keeps RF and DC magnetron process flexibility while extending coverage to 8 inch substrates for photovoltaic, sensor and transparent conductive oxide work.
Denton describe the CC-106 as their internally developed ion source, a broad beam cold cathode DC source. It is designed for ion assisted deposition and pre-clean processes and runs on oxygen or argon. Denton publish no numerical data for it on the ion sources page, where it is listed alongside their newer filament-free Endeavor RF ion source, which the page notes is currently available on new systems.
A benchtop thermal and low temperature evaporation system for metals, organics and sensitive materials. It gives research groups local evaporation capability for electrodes, contact layers, organic electronics and optical films.