Brand: Moorfield Nanotechnology | Category: Nanotechnology

A wide area version of the benchtop nanoPVD sputtering platform for larger research substrates. It keeps RF and DC magnetron process flexibility while extending coverage to 8 inch substrates for photovoltaic, sensor and transparent conductive oxide work.
| Parameter | Value |
|---|---|
| Base pressure | 5x10-7 mbar |
| Maximum substrate size | 8 inch (200 mm) |
| Sputter sources | up to 2 x 2 inch water cooled magnetrons |
| Process gas inlets | up to 3 MFC controlled gases |
| Substrate heating | up to 500 deg C optional |
| Process control | industrial PLC with 7 inch HMI touchscreen |
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Contact Vvon Technologies Limited about Moorfield Nanotechnology equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
A benchtop thermal and low temperature evaporation system for metals, organics and sensitive materials. It gives research groups local evaporation capability for electrodes, contact layers, organic electronics and optical films.
A compact benchtop RF and DC magnetron sputtering system for research laboratories and cleanrooms. It deposits metals, oxides, nitrides and multilayers on substrates up to 4 inches, with reactive and co-deposition options.
A hybrid benchtop system that combines magnetron sputtering with thermal and low temperature evaporation in a single chamber. It suits multilayer thin films, hybrid device stacks, contacts and seed layers where the process route is not yet fixed.