PlasmaPro 100 Estrelas DRIE
Brand: Oxford Instruments | Category: Nanotechnology
The PlasmaPro 100 Estrelas creates deep, steep sided trenches and vias in silicon. It runs both Bosch and cryogenic processes in the same chamber, covering high rate cavity etches, high aspect ratio features and tapered vias for MEMS and advanced packaging.
Technical Specifications
| Parameter | Value |
|---|---|
| Specification | Compatible with 50 mm to 200 mm substrates |
| Specification | Bosch and cryogenic processes run in the same chamber |
| Cryogenic process temperature | approximately -110 °C |
| Specification | Mechanical or electrostatic clamping |
| Specification | Heated liners and top plate |
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