PlasmaPro 100 PECVD
Brand: Oxford Instruments | Category: Nanotechnology
The PlasmaPro 100 PECVD deposits dielectric and silicon based films with control of refractive index, stress, electrical properties and wet chemical etch rate. Dual frequency power applied to the showerhead electrode allows stress control and film densification.
Technical Specifications
| Parameter | Value |
|---|---|
| Specification | Compatible with wafer sizes up to 200 mm |
| Resistive heated electrodes | up to 400 °C or 1200 °C |
| Dual frequency power | 13.56 MHz and 100 kHz applied to the upper electrode |
| Specification | Clustering of up to 4 process modules |
| Specification | Precursor delivery heated up to 70 °C |
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Phone: +8801805987890 | Email: info@vvon.com.bd
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