Brand: Oxford Instruments | Category: Nanotechnology

The PlasmaPro 100 Nano, formerly Nanofab, is a high temperature CVD and PECVD system for growing 1D and 2D nanomaterials and heterostructures. A cold wall chamber with showerhead delivery supports graphene, hBN, transition metal dichalcogenide and nanotube growth.
| Parameter | Value |
|---|---|
| Specification | Flexible temperatures up to 1200 °C |
| Table options | 700 °C, 800 °C or 1200 °C |
| Specification | Sample sizes up to 200 mm |
| Specification | Vacuum load lock for quick sample exchange |
| Specification | Cold wall design with showerhead based precursor delivery |
| Specification | Optional liquid and solid source delivery for MoS2, MoSe2 and other TMDs |
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Contact Vvon Technologies Limited about Oxford Instruments equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
Ionfab systems perform ion beam etching, milling and ion beam deposition in a single chamber, with beam energy and ion flux controlled independently. Platen tilt sets the sidewall profile, and handling options run from open load to cassette to cassette.
The PlasmaPro 100 ICPCVD uses a high density remote plasma to grow dielectric films at low temperature with little substrate damage. Typical materials include silicon dioxide, silicon nitride, silicon oxynitride, silicon and silicon carbide on wafers up to 200 mm.
A thermally induced chemical vapour deposition system for depositing uniform dielectric, semiconducting and metallic layers. Multi-zone heating with a rotating turntable and a bottom loader design suit pyrolytic carbon, silicon carbide and boron nitride coatings.