Brand: Oxford Instruments | Category: Nanotechnology

The PlasmaPro 100 RIE delivers isotropic and anisotropic dry etching across a wide process range. A single RF plasma source sets both ion density and energy, with load lock and cassette to cassette options for repeatable research and production work up to 200 mm.
Plan your specification
This RIE platform uses one RF plasma source to set both ion density and energy. Evaluate the required process before choosing RIE or a separate-bias ICP system.
| Parameter | Value |
|---|---|
| Operating pressure | 5 to 500 mTorr |
| Power density | 0.1 to 1.5 W/cm2 |
| Total gas flow | 5 to 200 sccm |
| DC bias generated on lower electrode | 30 to 800 V |
| Electrode temperature range | -150 °C to 400 °C |
| Specification | Clusters with up to 4 process modules |
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Contact Vvon Technologies Limited about Oxford Instruments equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
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