Brand: Oxford Instruments | Category: Nanotechnology

A PlasmaPro 100 Cobra configuration set up for volume VCSEL manufacture. The process gives a clean mesa sidewall finish, controlled profile angle for critical dimension control and very low footing, working with either photoresist or a hard mask.
| Parameter | Value |
|---|---|
| System uptime | over 90% |
| Specification | Precise control of profile angle for critical dimension control |
| Specification | Etch process supported with photoresist and hard mask |
| Specification | Controlled by PTIQ software |
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