Brand: Denton Vacuum | Category: Nanotechnology

A sputtering system built around Denton's patented inverted cylindrical magnetron cathode. The substrate sits inside the cylinder and is coated from all directions at once, which gives even coverage on curved and three dimensional parts without planetary rotation.
| Parameter | Value |
|---|---|
| Cathode | inverted cylindrical magnetron, ICM sputtering |
| Uniformity | within plus or minus 0.25 per cent on curved or 3D surfaces |
| Substrate size | 8 inch wafers |
| Applications | precision optics, 3D and complex substrates, medical stents and implants |
| Specification | Uniform target erosion improves target utilisation |
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Contact Vvon Technologies Limited about Denton Vacuum equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
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