Brand: Denton Vacuum | Category: Nanotechnology

A planar cathode magnetron sputtering module designed to run on the Versa cluster platform. The cathode sits directly above the substrate, which gives tight uniformity in film thickness, sheet resistance and refractive index across one side of the wafer.
| Parameter | Value |
|---|---|
| Cathode | 300 mm planar cathode |
| Substrate size | standard applications up to 200 mm wafers |
| Specification | Adjustable rotating magnet pack for uniformity optimisation |
| Specification | Designed for integration on the Versa cluster platform |
| Applications | thin film resistors and sensors, wafer metal and dielectric films, metal contacts of compound semiconductors |
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Contact Vvon Technologies Limited about Denton Vacuum equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
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