Infinity Ion Beam Deposition
Brand: Denton Vacuum | Category: Nanotechnology
An ion beam sputtering system that deposits dense films with tight thickness control, using a monoenergetic ion beam directed at a target. The Biased Target Sputter module keeps high energy ions near the target, which removes beam overspill and allows stress to be controlled.
Technical Specifications
| Parameter | Value |
|---|---|
| Technology | ion beam deposition with optional Biased Target Sputter module |
| Specification | Independent control of ion currents and ion energies |
| Specification | Operates at low pressure, with pulsed sputtering available |
| Specification | Uniformity achievable on large substrates without rotation |
| Options | ion assist source for pre-clean and densification, residual gas analyser, in-situ controls |
| Specification | Compatible with front ends from a single load lock to the Versa cluster tool |
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Contact Vvon Technologies Limited about Denton Vacuum equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
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