Brand: Semian | Category: Scientific & Laboratory Equipment

Dry adsorption system that removes and concentrates highly toxic compounds such as arsine, phosphine and germane from semiconductor effluent. Media can also be specified for organic compounds, high molecular weight VOCs, acid gases and ammonia.
| Parameter | Value |
|---|---|
| Inlet and outlet connection | 1.5 in KF 40 |
| Maximum inlet gas flow | up to 300 slm |
| Typical gas flow rate | 100 to 150 slm N2 |
| Maximum contaminant flow | 4 to 5% by volume in mixture |
| Canister dimensions | 12 in O.D. x 70 in tall |
| Specification | Single enclosure 32 in L x 32 in W x 92 in H, cabinet exhaust 300 cfm |
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Contact Vvon Technologies Limited about Semian equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
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Point of use wet scrubber range for semiconductor reactor effluent containing corrosive, toxic or reactive gases. It handles solids generating gases such as WF6, BCl3 and DCS, and is normally installed in the sub fab or cleanroom chase.
Point of use system combining a pyrophoric oxidation chamber with multistage wet scrubbing, for silicon nitride deposition and interlayer dielectric exhaust. Gases stay dry until the wet stage, which keeps the inlet port clear of deposits.
Passive gas treatment device for semiconductor process tool effluent, working without fuel gas or other utilities. It draws room air through the existing scrubber or ventilation system, which keeps running cost and maintenance time low.