Brand: Semian | Category: Scientific & Laboratory Equipment

Point of use system combining a pyrophoric oxidation chamber with multistage wet scrubbing, for silicon nitride deposition and interlayer dielectric exhaust. Gases stay dry until the wet stage, which keeps the inlet port clear of deposits.
| Parameter | Value |
|---|---|
| Specification | Pyrophoric oxidation using compressed air or clean dry air |
| Specification | Eductor venturi stage removes particulate such as SiO2 |
| Specification | Countercurrent packed section absorbs water soluble gases |
| Specification | High efficiency mist eliminator on outlet |
| Specification | Zero pressure drop with negative inlet pressure |
| Specification | UL, SEMI S2 and CE compliant |
Request an itemised quotation covering the proposed configuration, availability, lead time and agreed supply and support scope.
Share what you know. You can start with your name and a phone number or email; final specifications can follow.
Not sure which configuration you need? Help me choose
Contact Vvon Technologies Limited about Semian equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
Back to Scientific & Laboratory Equipment
Dry adsorption system that removes and concentrates highly toxic compounds such as arsine, phosphine and germane from semiconductor effluent. Media can also be specified for organic compounds, high molecular weight VOCs, acid gases and ammonia.
Point of use abatement system for PFC, SiF4 and acid gases from etch and CVD tools. A first water scrubber removes acid gases, a catalytic reactor breaks down the PFCs, and a second water scrubber removes the HF produced.
Point of use wet scrubber range for semiconductor reactor effluent containing corrosive, toxic or reactive gases. It handles solids generating gases such as WF6, BCl3 and DCS, and is normally installed in the sub fab or cleanroom chase.