ENVIRO-MATRIX Trinity
Brand: Semian | Category: Scientific & Laboratory Equipment
Point of use abatement system for PFC, SiF4 and acid gases from etch and CVD tools. A first water scrubber removes acid gases, a catalytic reactor breaks down the PFCs, and a second water scrubber removes the HF produced.
Technical Specifications
| Parameter | Value |
|---|---|
| Specification | Greater than 99.5% removal of SiF4 and acid gases in pre-scrubber |
| Specification | Greater than 95% destruction of PFCs in catalytic reactor |
| Specification | 99% removal of product HF in post scrubber |
| Capability | 4 chambers of 200 mm etch tool or 3 chambers of 300 mm etch tool |
| Specification | Flow rate 200 slpm, power less than 4 kW, water usage under 1 gpm |
| Specification | Dimensions 27 in D x 36 in W x 79 in H, catalyst life greater than 1 year |
Get a Quote
Request an itemised quotation covering the proposed configuration, availability, lead time and agreed supply and support scope.
Useful details to share
- Intended application, process or teaching activity
- Required capability and equipment it must work with
Share what you know. You can start with your name and a phone number or email; final specifications can follow.
Not sure which configuration you need? Help me choose
Contact Vvon Technologies Limited about Semian equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
Back to Scientific & Laboratory Equipment
More from Gas Scrubbers & Abatement
- ENVIRO-MATRIX Infinity
Point of use system combining a pyrophoric oxidation chamber with multistage wet scrubbing, for silicon nitride deposition and interlayer dielectric exhaust. Gases stay dry until the wet stage, which keeps the inlet port clear of deposits.
- SBW III_202_S
High capacity burn and wet scrubber handling 1200 SLM total flow with a heating chamber running at 800 to 850 degrees C. Hydrogen treatment is rated to 120 SLM, which suits epitaxy and other high hydrogen processes.
- ENVIRO-MATRIX Cyrus
Dry adsorption system that removes and concentrates highly toxic compounds such as arsine, phosphine and germane from semiconductor effluent. Media can also be specified for organic compounds, high molecular weight VOCs, acid gases and ammonia.