Focused Ion and Electron Beam System Ethos NX5000
Brand: Hitachi High-Tech | Category: Scientific & Laboratory Equipment
The Ethos NX5000 combines a field emission SEM column with a gallium focused ion beam for nanoscale processing and imaging. A microsampling system with orientation control prepares uniform TEM lamellas, and a triple beam option reduces milling artefacts.
Technical Specifications
| Parameter | Value |
|---|---|
| FIB accelerating voltage | 0.5 kV to 30 kV |
| FIB beam current | 100 nA |
| SIM resolution | 4 nm at 30 kV |
| SEM resolution | 1.5 nm at 1 kV, 0.7 nm at 15 kV |
| SEM accelerating voltage | 0.1 kV to 30 kV |
| Stage long distance tracking | 155 x 155 mm |
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