Brand: Hitachi High-Tech | Category: Scientific & Laboratory Equipment

The NX9000 arranges its SEM and FIB columns orthogonally so cross sections are imaged at normal incidence. This removes foreshortening during serial sectioning and allows 3D EDS and 3D EBSD to be collected without moving the stage.
| Parameter | Value |
|---|---|
| SEM electron source | cold cathode field emission |
| SEM accelerating voltage | 0.1 kV to 30 kV |
| SEM resolution | 1.6 nm at 15 kV, 2.1 nm at 1 kV |
| FIB accelerating voltage | 0.5 kV to 30 kV |
| FIB resolution | 4.0 nm at 30 kV, maximum probe current 100 nA |
| Maximum sample size | 6 mm x 6 mm, 2 mm thick |
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