Brand: SUSS MicroTec | Category: Nanotechnology

A compact manually loaded cleaning platform for photomasks and other delicate substrates, aimed at research and small series work. It brings develop, etch and cleaning steps into one cabinet, and also serves opto-electronics, OLED and semiconductor back end applications.
| Parameter | Value |
|---|---|
| Footprint | 960 x 1120 mm base cabinet, 300 x 1070 mm media cabinet |
| Loading | manual loading with automated process steps |
| Cleaning | dual megasonic, high-pressure Fulljet, brush, in-situ SC1/SPM and UV dry cleaning |
| Developing | A+ nozzle dispense with ASONIC megasonic technology |
| Environment | DIN EN ISO 14644 Class 2 |
| Compliance | SEMI S2, S8 and S13, CE marked, SECS/GEM 200/300 mm interface |
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Contact Vvon Technologies Limited about SUSS MicroTec equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
A semi-automated mask aligner and imprint platform for contact and proximity lithography. It exposes photoresist through a physical mask and also runs UV nanoimprint, serving MEMS and NEMS, advanced packaging, micro-optics and compound semiconductor work in research and pilot production.
An automated bake and develop platform for photomask production down to sub 32 nm masks. Dry flip handling, a feedback loop driven by measured critical dimension data and megasonic assisted development keep results consistent across long production runs.
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