MA/BA Gen4 Series Mask and Bond Aligner
Brand: SUSS MicroTec | Category: Nanotechnology
A semi-automated mask aligner and imprint platform for contact and proximity lithography. It exposes photoresist through a physical mask and also runs UV nanoimprint, serving MEMS and NEMS, advanced packaging, micro-optics and compound semiconductor work in research and pilot production.
Technical Specifications
| Parameter | Value |
|---|---|
| Overlay accuracy | 0.5 µm with optional DirectAlign technology |
| Resolution | down to 0.8 µm in hard, soft or vacuum contact |
| Alignment | top-side, bottom-side and infrared |
| Illumination | MO Exposure Optics with telecentric illumination |
| Versions | MA/BA6 Gen4, MA/BA8 Gen4 and MA/BA Gen4 Pro |
| Imprint | SMILE technology for standard to high-end imprint |
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Contact Vvon Technologies Limited about SUSS MicroTec equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
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