MJB4 Manual Mask Aligner
Brand: SUSS MicroTec | Category: Nanotechnology
A compact manual mask aligner for research and small volume production. It takes pieces from 5 by 5 mm up to 100 mm wafers, prints in soft, hard and vacuum contact, and also supports UV nanoimprint lithography on fragile materials.
Technical Specifications
| Parameter | Value |
|---|---|
| Substrate range | pieces from 5 x 5 mm up to 100 mm wafers |
| Substrate thickness | up to 4 mm |
| Resolution | from 2 µm down to less than 0.5 µm |
| Exposure modes | soft, hard and vacuum contact |
| Alignment | top-side or infrared, Singlefield or Splitfield microscope |
| Illumination | MO Exposure Optics with micro-lens plates |
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Contact Vvon Technologies Limited about SUSS MicroTec equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
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