LabSpin Series Spin Coater and Developer
Brand: SUSS MicroTec | Category: Nanotechnology
A manual bench-top spin coater and developer for photolithography in laboratories. It spreads resist and other chemicals evenly over round or square substrates, and can be fitted with dispense, edge bead removal, puddle developer and nitrogen drying options.
Technical Specifications
| Parameter | Value |
|---|---|
| Spin speed | 50 to 8,000 rpm with 200 mm chuck |
| Acceleration | 200 rpm/s up to 3,000 rpm/s |
| LabSpin6 substrates | up to 150 mm round or 100 x 100 mm square |
| LabSpin8 substrates | up to 200 mm round or 150 x 150 mm square |
| Recipes | up to 200 recipes with 40 steps each |
| Installation | table-top, wet bench, glove box or SUSS LabCluster |
Get a Quote
Request an itemised quotation covering the proposed configuration, availability, lead time and agreed supply and support scope.
Useful details to share
- Materials, sample dimensions and process or measurement goal
- Required performance and existing instrument interfaces
Share what you know. You can start with your name and a phone number or email; final specifications can follow.
Not sure which configuration you need? Help me choose
Contact Vvon Technologies Limited about SUSS MicroTec equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
More from Lithography & Patterning
- RCD8 Semi-Automated Coater and Developer
A semi-automated resist coating and developing module for wafers up to 200 mm. It suits research and small scale production, handling everything from very thin films to highly viscous thick resists, and runs alone or inside a SUSS LabCluster.
- DSC300 Gen3 Projection Scanner
An automated projection lithography scanner for advanced packaging on 300 mm and 200 mm wafers. Wynne-Dyson optics print 2 µm lines and spaces with a large depth of focus, and the stitchless full field scan removes step field size limits on the layout.
- HP8 Hot Plate for Manual Coating
A compact manual hot plate for the soft bake, post exposure bake and hard bake steps of a research coating line. It takes round substrates up to 200 mm or 6 inch squares and uses coil heating with three lifting pins for handling.