Brand: SUSS MicroTec | Category: Nanotechnology

A semi-automated resist coating and developing module for wafers up to 200 mm. It suits research and small scale production, handling everything from very thin films to highly viscous thick resists, and runs alone or inside a SUSS LabCluster.
| Parameter | Value |
|---|---|
| Substrate size | wafers up to 200 mm |
| Spin speed | up to 10,000 rpm, upgradeable to 12,000 rpm |
| Acceleration | 7,000 rpm/s |
| Viscosity range | less than 1 cps up to 55,000 cps |
| Modules | coater, developer, hotplate and vapour primer |
Request an itemised quotation covering the proposed configuration, availability, lead time and agreed supply and support scope.
Share what you know. You can start with your name and a phone number or email; final specifications can follow.
Not sure which configuration you need? Help me choose
Contact Vvon Technologies Limited about SUSS MicroTec equipment requirements in Bangladesh.
Phone: +8801805987890 | Email: info@vvon.com.bd
A compact manual hot plate for the soft bake, post exposure bake and hard bake steps of a research coating line. It takes round substrates up to 200 mm or 6 inch squares and uses coil heating with three lifting pins for handling.
A manual bench-top spin coater and developer for photolithography in laboratories. It spreads resist and other chemicals evenly over round or square substrates, and can be fitted with dispense, edge bead removal, puddle developer and nitrogen drying options.
A compact semi-automated spin coater or developer for substrates up to 200 mm. It has an integrated media cabinet, a transparent hood that keeps the process in view and one-hand wafer centring, and is configured either as a coater or as a developer.