PlasmaPro ASP
Brand: Oxford Instruments | Category: Nanotechnology
PlasmaPro ASP is a remote plasma enhanced ALD system sharing the Atomfab platform. It deposits conformal oxides and nitrides across 200 mm wafers at high rate, using a low volume chamber for rapid gas exchange and a biased electrode for tuning film properties.
Technical Specifications
| Parameter | Value |
|---|---|
| Precursor lines | maximum 6, any combination |
| Precursor size | 200 ml |
| Wafer electrode | 200 mm with bias, up to 400 °C deposition temperature |
| Heated inner chamber | 200 °C |
| Gas pod | 4 process plus 1 Ar onboard |
| Roughing pump | 600 m3/hr |
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